Effect of Vanadium Layer on Microstructure and Properties of TC4 (Ti-6Al-4V)/TiAl (Ti-48Al-2Cr-2Nb) Dissimilar Metals Produced by Laser Additive Manufacturing

Dissimilar metal samples of TC4/TiAl were successfully prepared by laser additive manufacturing (LAM) technology, with pure vanadium as the interlayer. The microstructure, phase composition, element distribution and mechanical properties at interface TC4/V TiAl/V analyzed optical microscope (OM), scanning electron (SEM) backscattering diffraction (EBSD). experimental results showed that microstructure is mainly composed γ, α2 V solid solution. β-Ti There are no holes, metallurgical defects or microcracks above two interfaces, bonded well. With increase in number deposition layers, bonding depth increases, its thickness increases from 30 μm to 80 μm. tests tensile strength elongation dissimilar metals layers interlayer highest, their values 483 MPa 0.35%, respectively. Compared one-layer intermediate layer sample (tensile 405 MPa, 0.24%), increased 19.2% 45%, three-layer lowest, 350 0.16%.